Project | Specification Description |
UV Energy | >3000mj/cm2 |
Wavelength | 365mn |
lrradiation Temperature | <60°C |
Supported lrradiation Range | 250*250mm |
SECS/GEM Protocol | SEMIE5、E30、E37、E37.1、142 |
Dimension | 1100*550*1750mm |

UV Irradiation Machine
Suitable for IC assembly and sputtering process, and can be used for UV tape detaping process, UV tape viscosity removal and other processes of optical lenses, filters, LEDs, integrated circuit boards and other semiconductor materials.
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